context: Further, an insulating film 104 comprising silicon oxide or the like is formed, covering the active layer 103.
answer_0: Previously, on the insulating film 104, a film comprising an anodizable material is formed.
answer_1: Second, on the insulating film 104, a film comprising an anodizable material is formed.
answer_2: Further, on the insulating film 104, a film comprising an anodizable material is formed.
answer_3: By comparison, on the insulating film 104, a film comprising an anodizable material is formed.
answer_4: Plus, on the insulating film 104, a film comprising an anodizable material is formed.
answer_5: Locally, on the insulating film 104, a film comprising an anodizable material is formed.
answer_6: Also, on the insulating film 104, a film comprising an anodizable material is formed.
answer_7: Lastly, on the insulating film 104, a film comprising an anodizable material is formed.
answer_8: Suddenly, on the insulating film 104, a film comprising an anodizable material is formed.
answer_9: Meanwhile, on the insulating film 104, a film comprising an anodizable material is formed.